Contaminant detection system, contaminant detecting method, and semiconductor manufacturing apparatus

Contaminant detection system, contaminant detecting method, and semiconductor manufacturing apparatus

A contaminant detection system includes a light source configured to emit excitation light on an object to be inspected; a detector configured to detect fluorescence emitted from a contaminant adhering to the object to be inspected; and a processor. The fluorescence is caused by emission of the exci...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MORIYA, TSUYOSHI, MORI, TAKUYA, ENOKI, YOSHITAKA, TOYAMA, TOKIO, TAKAHASHI, MICHIHIRO
Format: Patent
Sprache:chi ; eng
Schlagworte:
CALCULATING
COMPUTING
COUNTING
IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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Beschreibung
Zusammenfassung:A contaminant detection system includes a light source configured to emit excitation light on an object to be inspected; a detector configured to detect fluorescence emitted from a contaminant adhering to the object to be inspected; and a processor. The fluorescence is caused by emission of the excitation light from the light source onto the object to be inspected. The processor is configured to perform a determination of a location of the contaminant and a type of the contaminant, based on the fluorescence emitted from the contaminant; and output a result of the determination.