Method of inspecting a sample, and multi-electron beam inspection system
A method for inspecting a sample with a multi-electron beam inspection system is described. The method includes: placing the sample on a movable stage extending in an X-Y-plane; generating a plurality of electron beams propagating toward the sample; focusing the plurality of electron beams on the sa...
Gespeichert in:
Hauptverfasser: | , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | A method for inspecting a sample with a multi-electron beam inspection system is described. The method includes: placing the sample on a movable stage extending in an X-Y-plane; generating a plurality of electron beams propagating toward the sample; focusing the plurality of electron beams on the sample at a plurality of probe positions in a two-dimensional array; scanning the sample surface by moving the movable stage in a predetermined scanning pattern while maintaining the plurality of electron beams stationary; and detecting signal electrons emitted from the sample during the movement of the movable stage for inspecting the sample. Further, a multi-electron beam inspection system for inspecting a sample according to the above method is described. |
---|