Method of inspecting a sample, and multi-electron beam inspection system

A method for inspecting a sample with a multi-electron beam inspection system is described. The method includes: placing the sample on a movable stage extending in an X-Y-plane; generating a plurality of electron beams propagating toward the sample; focusing the plurality of electron beams on the sa...

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Bibliographische Detailangaben
Hauptverfasser: MUELLER, BERNHARD G, NUNAN, PETER
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:A method for inspecting a sample with a multi-electron beam inspection system is described. The method includes: placing the sample on a movable stage extending in an X-Y-plane; generating a plurality of electron beams propagating toward the sample; focusing the plurality of electron beams on the sample at a plurality of probe positions in a two-dimensional array; scanning the sample surface by moving the movable stage in a predetermined scanning pattern while maintaining the plurality of electron beams stationary; and detecting signal electrons emitted from the sample during the movement of the movable stage for inspecting the sample. Further, a multi-electron beam inspection system for inspecting a sample according to the above method is described.