Frame for vapor deposition masks, frame-attached vapor deposition mask, and vapor deposition method

Provided is a frame for vapor deposition masks, which is lightweight, has high stiffness, and rarely undergoes the generation of an out gas. The frame for vapor deposition masks according to one embodiment is provided with a frame main body which is so configured as to hold a vapor deposition mask....

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	WAKABAYASHI, TADASHI, NOMOTO, MASASHI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	Provided is a frame for vapor deposition masks, which is lightweight, has high stiffness, and rarely undergoes the generation of an out gas. The frame for vapor deposition masks according to one embodiment is provided with a frame main body which is so configured as to hold a vapor deposition mask. In the frame main body, each of a base material and a reinforcing material comprises a composite material composed of an inorganic solid material.