Apparatus for processing substrate and injecting module of apparatus for processing substrate

The present invention relates to an apparatus for processing substrate and an injecting module of apparatus for processing substrate. The apparatus for processing substrate including: a chamber providing a processing space; a lid covering an upper portion of the chamber; a substrate supporting unit...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: YEO, INOL, KIM, JONGUL, BACK, IN-WOO, BYEON, YEONG-SEOP
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The present invention relates to an apparatus for processing substrate and an injecting module of apparatus for processing substrate. The apparatus for processing substrate including: a chamber providing a processing space; a lid covering an upper portion of the chamber; a substrate supporting unit supporting at least one substrate and rotating about a rotation shaft; a gas injecting unit disposed over a diameter direction with respect to the rotation shaft of the substrate supporting unit to inject a processing gas; and a measurement unit measuring a temperature of a substrate supported by the substrate supporting unit or a temperature of the substrate supporting unit at a measurement position apart from the diameter direction. The measurement unit is disposed in parallel with the diameter direction or disposed to be inclined in a direction having a certain angle with respect to the diameter direction.