Cleaning device, polishing device, and device and method for calculating rotational rate of substrate in cleaning device

This cleaning device is provided with a plurality of rollers that retain a peripheral edge section of a substrate, a rotary drive unit that causes the substrate to rotate by driving the plurality of rollers to rotate, a cleaning member that is in contact with the substrate and cleans the substrate,...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	NAKANO, HISAJIRO, KUNISAWA, JUNJI, MATSUDA, MICHIAKI, WATANABE, YUSUKE, OGAKI, FUYUKI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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Beschreibung
Zusammenfassung:	This cleaning device is provided with a plurality of rollers that retain a peripheral edge section of a substrate, a rotary drive unit that causes the substrate to rotate by driving the plurality of rollers to rotate, a cleaning member that is in contact with the substrate and cleans the substrate, a cleaning fluid supply nozzle that supplies a cleaning fluid to the substrate, a microphone that senses sound produced by a notch in the peripheral edge section of the substrate striking the plurality of rollers, and a rotational rate calculation unit that calculates the rotational rate of the substrate on the basis of the sounds sensed by the microphone.