Substrate processing method and substrate processing device
A substrate processing method according to an embodiment of the present invention includes a forming step, a drying step, and a plasma step. The forming step is for forming on the substrate a liquid film including an organic substance. The drying step is for drying the substrate on which the liquid...
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| Format: | Patent |
| Sprache: | chi ; eng |
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| Zusammenfassung: | A substrate processing method according to an embodiment of the present invention includes a forming step, a drying step, and a plasma step. The forming step is for forming on the substrate a liquid film including an organic substance. The drying step is for drying the substrate on which the liquid film has been formed. The plasma step is for performing plasma processing on the substrate having been dried. |
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