Method of manufacturing sintered body and method of manufacturing sputtering target capable of easily manufacturing a sintered body with suppressed cracks
The object of the present invention is to provide a method of manufacturing a sintered body capable of easily manufacturing a sintered body with suppressed cracks, and a method of manufacturing a sputtering target. A method of manufacturing a sintered body according to an embodiment of the present i...
Gespeichert in:
1. Verfasser: | |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The object of the present invention is to provide a method of manufacturing a sintered body capable of easily manufacturing a sintered body with suppressed cracks, and a method of manufacturing a sputtering target. A method of manufacturing a sintered body according to an embodiment of the present invention includes: a step of forming a granulated material of raw material powder including metal powder and metal oxide powder, and a step of calcining the granulated material, the raw material powder including Mn, Cu, and Zn used as metal elements, the volume ratio of the metal powder in the raw material powder being 28.0% by volume or more, and the sintering pressure in the calcination step being 20 MPa or more. |
---|