Ion implantation apparatus and mechanical arm

A mechanical arm and an ion implantation apparatus are provided. The mechanical arm includes a first arm, a second arm, a third arm, a vertical arm and a wafer holder. The long axis of the first arm, the second arm and the third arm is perpendicular to the Z axis. The proximal end of the second arm...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	LIN, WEING, LIN, CHUNIEH
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A mechanical arm and an ion implantation apparatus are provided. The mechanical arm includes a first arm, a second arm, a third arm, a vertical arm and a wafer holder. The long axis of the first arm, the second arm and the third arm is perpendicular to the Z axis. The proximal end of the second arm is pivotally connected to the distal end of the first arm. The proximal end of the third arm is pivotally connected to the distal end of the second arm. The lower end of the vertical arm is fixedly connected to the distal end of the third arm. The wafer holder is pivotally connected to the upper end of the vertical arm along a pivoting direction. The pivoting direction is perpendicular to the long axis direction of the vertical arm and is not parallel to the long axis of the third arm.