Device and method for eliminating foreign substance on substrate

Provided are a device and method for eliminating a foreign substance on a substrate, wherein a rotating roll brush is brought into direct contact with a circuit board to eliminate a foreign substance on the circuit board. The device for eliminating a foreign substance on a substrate comprises: a bod...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: IM, BYUNG-HYUN, PARK, CHANG-SUNG, GU, EUI-SEO, JANG, JONG-SOO, KIM, KYOUNG-SUN
Format: Patent
Sprache:chi ; eng
Schlagworte:
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Beschreibung
Zusammenfassung:Provided are a device and method for eliminating a foreign substance on a substrate, wherein a rotating roll brush is brought into direct contact with a circuit board to eliminate a foreign substance on the circuit board. The device for eliminating a foreign substance on a substrate comprises: a body part including a first rail formed in a first direction on a support and a second rail formed in a second direction on the support; a substrate moving part disposed on the second rail to move a substrate; and a brushing part disposed on the first rail and including a housing having a through-hole formed therethrough and a roll brush installed in the inner space of the housing, wherein the roll brush of the brushing part comes into contact with the substrate through the through-hole to eliminate the foreign substance from the substrate.