Inductively coupled antenna and plasma processing device capable of improving the uniformity of plasma density
To provide an inductively coupled antenna and a plasma processing device for improving the uniformity of plasma density. A rectangular frame-shaped inductively coupled antenna, which forms an induced electric field for generating the plasma in a processing container that performs plasma processing o...
Gespeichert in:
Hauptverfasser: | , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | To provide an inductively coupled antenna and a plasma processing device for improving the uniformity of plasma density. A rectangular frame-shaped inductively coupled antenna, which forms an induced electric field for generating the plasma in a processing container that performs plasma processing on a rectangular substrate mounted on a mounting surface of a mounting table, and has an opposing surface facing the mounting surface, is characterized by comprising: a flat surface part, in which four antenna wires are wound by respectively shifting their positions by 90 DEG on the facing surface; and a longitudinal winding part, in which at each end of the aforementioned antenna wire, winding is performed around a winding axis parallel to the aforementioned facing surface and intersecting the corner part of the aforementioned rectangular frame, so as to form a bottom flat surface sharing the aforementioned facing surface while performing longitudinal winding. |
---|