Inductively coupled antenna and plasma processing device capable of improving the uniformity of plasma density

To provide an inductively coupled antenna and a plasma processing device for improving the uniformity of plasma density. A rectangular frame-shaped inductively coupled antenna, which forms an induced electric field for generating the plasma in a processing container that performs plasma processing o...

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Bibliographische Detailangaben
Hauptverfasser: TOJO, TOSHIHIRO, SAITO, HITOSHI
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:To provide an inductively coupled antenna and a plasma processing device for improving the uniformity of plasma density. A rectangular frame-shaped inductively coupled antenna, which forms an induced electric field for generating the plasma in a processing container that performs plasma processing on a rectangular substrate mounted on a mounting surface of a mounting table, and has an opposing surface facing the mounting surface, is characterized by comprising: a flat surface part, in which four antenna wires are wound by respectively shifting their positions by 90 DEG on the facing surface; and a longitudinal winding part, in which at each end of the aforementioned antenna wire, winding is performed around a winding axis parallel to the aforementioned facing surface and intersecting the corner part of the aforementioned rectangular frame, so as to form a bottom flat surface sharing the aforementioned facing surface while performing longitudinal winding.