E-beam apparatus

An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a...

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Bibliographische Detailangaben
Hauptverfasser: BAGGEN, MARCEL KOENRAAD MARIE, HEMPENIUS, PETER PAUL, KREMERS, MAARTEN FRANS JANUS, HOL, SVEN ANTOIN JOHAN, BOSCH, NIELS JOHANNES MARIA, VAN DE GROES, HENRICUS MARTINUS JOHANNES
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.