Lithographic system

An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening ar...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	YAGHOOBI, PARHAM, ALBRIGHT, RONALD PETER, RANJAN, MANISH, HUANG, YANG-SHAN, RAASVELD, THOMAS MAARTEN, UMSTADTER, KARL ROBERT, NIKIPELOV, ANDREY, BANINE, VADIM YEVGENYEVICH, BRULS, RICHARD JOSEPH, FRIJNS, OLAV WALDEMAR VLADIMIR, DE VRIES, SJOERD FRANS, HUANG, ZHUANG-XIONG, MOORS, JOHANNES HUBERTUS JOSEPHINA, VAN DE KERKHOF, MARCUS ADRIANUS, BAL, KURSAT, JACOBS, JOHANNES HENRICUS WILHELMUS, TE SLIGTE, EDWIN, UZGOREN, ERAY, NENCHEV, GEORGI NENCHEV
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.