Semiconductor analysis system

This semiconductor analysis system is provided with: a processing device which produces a thin film sample for observation by processing a semiconductor wafer; a transmission electron microscope device which obtains a transmission electron microscopic image of the thin film sample; and a high order...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: KUBO, YUDAI, CHIBA, HIROYUKI, NOMAGUCHI, TSUNENORI
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:This semiconductor analysis system is provided with: a processing device which produces a thin film sample for observation by processing a semiconductor wafer; a transmission electron microscope device which obtains a transmission electron microscopic image of the thin film sample; and a high order control device which controls the processing device and the transmission electron microscope device. The high order control device performs an evaluation of the thin film sample on the basis of the transmission electron microscopic image, updates the processing conditions on the basis of the evaluation results of the thin film sample, and outputs the updated processing conditions to the processing device.