Patterned X-ray emitting target, and X-ray reflectance scatterometry system, X-ray photoelectron spectroscopy system, X-ray fluorescence system and X-ray system comprising said patterned X-ray emitting target

The present invention is intended to provide improved patterned X-ray emitting targets as well as X-ray sources that include patterned X-ray emitting targets as well as X-ray reflectance scatterometry (XRS) systems and also including X-ray photoelectron spectroscopy (XPS) systems and X-ray fluoresce...

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Hauptverfasser: SCHUELER, BRUNO W, NEWCOME, BRUCE H, REED, DAVID A
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The present invention is intended to provide improved patterned X-ray emitting targets as well as X-ray sources that include patterned X-ray emitting targets as well as X-ray reflectance scatterometry (XRS) systems and also including X-ray photoelectron spectroscopy (XPS) systems and X-ray fluorescence (XRF) systems which employ such X-ray emitting targets.