Patterned X-ray emitting target, and X-ray reflectance scatterometry system, X-ray photoelectron spectroscopy system, X-ray fluorescence system and X-ray system comprising said patterned X-ray emitting target
The present invention is intended to provide improved patterned X-ray emitting targets as well as X-ray sources that include patterned X-ray emitting targets as well as X-ray reflectance scatterometry (XRS) systems and also including X-ray photoelectron spectroscopy (XPS) systems and X-ray fluoresce...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The present invention is intended to provide improved patterned X-ray emitting targets as well as X-ray sources that include patterned X-ray emitting targets as well as X-ray reflectance scatterometry (XRS) systems and also including X-ray photoelectron spectroscopy (XPS) systems and X-ray fluorescence (XRF) systems which employ such X-ray emitting targets. |
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