Sub-field control of a lithographic process and associated apparatus
Disclosed is a method for determining a correction for control of a lithographic process for exposing a pattern on an exposure field using a lithographic apparatus. The method comprises obtaining a spatial profile describing spatial variation of a performance parameter across at least a portion of t...
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| creator | KATTOUW, HANS ERIK THIJSSEN, THEO WILHELMUS MARIA KLINKHAMER, JACOB FREDRIK FRISO ALTINI, VALERIO |
| description | Disclosed is a method for determining a correction for control of a lithographic process for exposing a pattern on an exposure field using a lithographic apparatus. The method comprises obtaining a spatial profile describing spatial variation of a performance parameter across at least a portion of the exposure field and co-determining control profiles for the spatial profile to minimize error in the performance parameter while ensuring a minimum contrast quality. The co-determined control profiles comprise at least a stage control profile for control of a stage arrangement of the lithographic apparatus and a lens manipulator control profile for control of a lens manipulator of the lithographic apparatus operable to perform a correction for at least magnification in a direction perpendicular to the substrate plane. |
| format | Patent |
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The method comprises obtaining a spatial profile describing spatial variation of a performance parameter across at least a portion of the exposure field and co-determining control profiles for the spatial profile to minimize error in the performance parameter while ensuring a minimum contrast quality. 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| language | chi ; eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Sub-field control of a lithographic process and associated apparatus |
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