High chemical resistance of forward osmosis membrane

High chemical resistance of forward osmosis membrane

This invention provides a high chemical resistance of forward osmosis membrane, which comprises of a backing layer, a hydrophilic support layer, and an active layer. Said hydrophilic support layer substantially consists of a plurality of nanostructures. Each said nanostructure substantially consists...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: CHUNG, LI-HAN, LEE, HSIN-HUA, TAI, NYAN-HWA, LEE, CHI-YOUNG, CHANG, MINAO, LIN, GUAN-YOU
Format: Patent
Sprache:chi ; eng
Schlagworte:
MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES
NANOTECHNOLOGY
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
SEPARATION
SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
TRANSPORTING
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Beschreibung
Zusammenfassung:This invention provides a high chemical resistance of forward osmosis membrane, which comprises of a backing layer, a hydrophilic support layer, and an active layer. Said hydrophilic support layer substantially consists of a plurality of nanostructures. Each said nanostructure substantially consists of a carbon nanotube and a hydrophilic thin film covering each of said corresponding carbon nanotubes. A first surface of said hydrophilic support layer contacts with a surface of said backing layer. Said active layer covers a second surface of the hydrophilic support layer which is opposite to said first surface of said hydrophilic support layer and contacts with the second surface of said hydrophilic support layer.