Process for removing an impurity from a chlorosilane mixture

The invention relates to a process for at least partially removing an impurity from a mixture containing at least one chlorosilane and/or organo chlorosilane and at least one impurity from the group comprising boron compound, phosphorus compound, arsenic compound and antimony compound. The process comprises the steps of: (a) contacting the liquid mixture with a carrier material functionalized with an amidoxime of general structural formula (I), where CAR = carrier material and R1, R2 are independently of one another H, alkyl, alkenyl, aryl, alkylaryl; (b) optionally removing the functionalized carrier material.