Substrate processing apparatus can process substrates of different sizes in one apparatus

The purpose of the present invention is to provide a substrate processing apparatus. The substrate processing apparatus can process substrates of different sizes in one apparatus without the need of component replacement time and the preparation time for the apparatus to start up, thereby the improv...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: PARK, SANG-PIL, RYU, SU-RYEOL, CHOI, WOO-JIN, OH, JOON-HO, SON, HYUK-JOO, PARK, YOUNG-SOO, LEE, MIN-YOUNG
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The purpose of the present invention is to provide a substrate processing apparatus. The substrate processing apparatus can process substrates of different sizes in one apparatus without the need of component replacement time and the preparation time for the apparatus to start up, thereby the improving process efficiency of the substrate processing apparatus. The substrate processing apparatus implemented in the present invention includes: a substrate supporting pin for supporting the bottom surface of the substrate, and at least two substrate placing portions formed for placing substrates of different sizes.