Cross section imaging with improved 3D volume image reconstruction accuracy

The present invention relates to a three-dimensional circuit pattern inspection technique by cross sectioning of integrated circuits and, more particularly, to a method, computer program product and apparatus for obtaining a 3D volume image of an integrated semiconductor sample. The method employs a...

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Bibliographische Detailangaben
Hauptverfasser: NEUMANN, JENS TIMO, AVISHAI, AMIR, BUXBAUM, ALEX, SCHULMEYER, INGO, FOCA, EUGEN, KLOCHKOV, DMITRY, LEE, KEUM-SIL, KORB, THOMAS
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The present invention relates to a three-dimensional circuit pattern inspection technique by cross sectioning of integrated circuits and, more particularly, to a method, computer program product and apparatus for obtaining a 3D volume image of an integrated semiconductor sample. The method employs a feature based alignment of cross section images based on features of an integrated semiconductor sample.