Large-size thin-film deposition substrate and method for manufacturing same, segmented thin-film deposition substrate and method for manufacturing same, and production management method and production management system thereof

Provided is a method for manufacturing a large-size thin-film deposition substrate with which it is possible to reduce manufacturing costs of a large-size thin-film deposition substrate and segmented thin-film deposition substrates which include identification marks, and to improve precision in read...

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Bibliographische Detailangaben
1. Verfasser: ASATANI, TSUYOSHI
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:Provided is a method for manufacturing a large-size thin-film deposition substrate with which it is possible to reduce manufacturing costs of a large-size thin-film deposition substrate and segmented thin-film deposition substrates which include identification marks, and to improve precision in reading said identification marks. The method for manufacturing a large-size thin-film deposition substrate comprises: a marking step of marking at least one identification mark M for each segmented region which is segmented by a dicing line L on one primary surface side of a pre-dicing large-size substrate 11; and a thin-film deposition step of generating a large-size thin-film deposition substrate 2 by thin-film deposition on the large-size substrate 11 except for the position of the identification mark M. In the marking step, one marking device with a markable region A1 smaller than the large-size substrate 11 is used to simultaneously mark all of the identification marks M on the large-size substrate 11 such that w