Bessel laser system with variable focal length mechanism capable of dynamically adjusting focal length during laser processing
The present invention relates to a Bessel laser system with variable focal length mechanism, which enables a laser emitting device that generates a laser beam with fixed diameter to achieve the variable focal length effect by changing diameter of laser beam. In one embodiment, a diameter adjusting m...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The present invention relates to a Bessel laser system with variable focal length mechanism, which enables a laser emitting device that generates a laser beam with fixed diameter to achieve the variable focal length effect by changing diameter of laser beam. In one embodiment, a diameter adjusting module may change the diameter of laser beam; then, a modulating phase conversion module may change the laser beam into a gradually and radially symmetrical gradual diameter; finally, a focusing lens module may focus the laser beam at a working point. In another embodiment, the modulating phase conversion module may change the laser beam into the gradually and radially symmetrical gradual diameter; then, a variable curvature lens module may change the diameter of laser beam; finally, the focusing lens module may focus the laser beam at a working point. The present invention may also mix the aforementioned applications to achieve better variable focal length effect. |
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