Touch penal and manufacturing method thereof

The disclosure relates to a touch penal and manufacturing method thereof. The touch penal comprises the substrate, the first touch induction electrode, the second touch induction electrode and the insulating layer. The first peripheral wire and the second peripheral wire are located at the periphera...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HSIAO, CHUNGIN, LIEN, SIOUNG, HSIAO, CHI-FAN
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The disclosure relates to a touch penal and manufacturing method thereof. The touch penal comprises the substrate, the first touch induction electrode, the second touch induction electrode and the insulating layer. The first peripheral wire and the second peripheral wire are located at the peripheral region of the substrate. Wherein, the first touch induction electrode layer comprises the first portion of the first patterned metal nanowire layer. The peripheral region comprises the co-etched conductive layer and the second portion of the first metal nanowire layer. The conductive layer and the second portion of the first metal nanowire layer have the co-etched surface. The second touch induction electrode is formed above the insulating layer and connects with the second peripheral wire. The insulating layer may be made of a low dielectric constant material.