Fe-Pt-BN-based sputtering target and production method therefor

The present invention adopts a different approach from conventional methods in order to solve the problem of particle generation from a Fe-Pt-BN-based sputtering target having a high relative density. This Fe-Pt-BN-based sputtering target has a relative density of 90% or more and a Vickers hardness...

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Bibliographische Detailangaben
Hauptverfasser:	NISHIURA, MASAHIRO, KUROSE, KENTA, MIYASHITA, TAKANOBU, KOBAYASHI, HIRONORI, YAMAMOTO, TAKAMICHI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ALLOYS CASTING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL FERROUS OR NON-FERROUS ALLOYS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MAKING METALLIC POWDER MANUFACTURE OF ARTICLES FROM METALLIC POWDER METALLURGY PERFORMING OPERATIONS POWDER METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING TREATMENT OF ALLOYS OR NON-FERROUS METALS WORKING METALLIC POWDER
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Beschreibung
Zusammenfassung:	The present invention adopts a different approach from conventional methods in order to solve the problem of particle generation from a Fe-Pt-BN-based sputtering target having a high relative density. This Fe-Pt-BN-based sputtering target has a relative density of 90% or more and a Vickers hardness of 150 or less, and is capable of minimizing the number of particles generated therefrom during magnetron sputtering.