Method for producing InP quantum dot precursors and method for producing InP quantum dots

The present invention pertains to a method for producing InP quantum dot precursors from a phosphorus source and an indium source, wherein a silylphosphine compound represented by general formula (1), which contains a compound represented by general formula (2) in an amount of 0.3 mol% or less, is u...

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Bibliographische Detailangaben
Hauptverfasser: SAKANOUE, TOMO, NAKATSUI, KAZUHIRO, TSUZUKIISHI, TAIKI
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The present invention pertains to a method for producing InP quantum dot precursors from a phosphorus source and an indium source, wherein a silylphosphine compound represented by general formula (1), which contains a compound represented by general formula (2) in an amount of 0.3 mol% or less, is used as the phosphorus source. Further, the present invention provides a method for producing InP quantum dots, said method comprising heating the InP quantum dot precursors at a temperature of 200-350 DEG C inclusive to thereby give InP quantum dots. (R is as defined in the description.).