Glass etching solution and glass substrate manufacturing method

To provide a liquid crystal panel manufacturing method capable of minimizing the effects of side etching that accompany etching processes. A glass etching solution according to the present invention is a glass etching solution for etching glass, said solution including at least an etching inhibiting...

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Hauptverfasser: KASHIHARA, YASUHIRO, NAGAI, ATSUSHI, FUKUNARI, RYOUSUKE, HAYASHI, ATSUSHI, SAITOU, SHUNSUKE, OOKODA, KENTA, FUKA, NATSUKI, OOYAMA, KIYONOBU, MIYOSHI, YUUZOU, ISHIGAKI, MASAKI, NISHIKAWA, HARUKA, KUME, TAKAHIRO, SHIMADA, KAZUYA, MOTOMOCHI, TAKESHI
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:To provide a liquid crystal panel manufacturing method capable of minimizing the effects of side etching that accompany etching processes. A glass etching solution according to the present invention is a glass etching solution for etching glass, said solution including at least an etching inhibiting substance which lowers the etching speed of glass and contains at least an alkali or a fluorine complex agent. The etching inhibiting substance preferably generates a reaction product which inhibits an etching reaction by attaching to a modified section which has been modified so as to make glass more readily etchable.