Device for treating substrate with solution, and method for treating substrate with solution

A device for treating a substrate with a solution comprises a substrate holding section for holding the substrate, a treatment solution feeding section for feeding a treatment solution to the upper surface of the substrate held by the substrate holding section, a lid body for covering the upper surf...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	KANEKO, SATOSHI, MOTOMATSU, KAZUKI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL PERFORMING OPERATIONS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	A device for treating a substrate with a solution comprises a substrate holding section for holding the substrate, a treatment solution feeding section for feeding a treatment solution to the upper surface of the substrate held by the substrate holding section, a lid body for covering the upper surface of the substrate held by the substrate holding section, and a gas feeding section for feeding an inert gas to a space between the substrate held by the substrate holding section and the lid body and provided with a gas feeding port through which the inert gas is to be ejected, wherein the direction of opening of the gas feeding port is angled to a direction other than the direction toward the upper surface of the substrate held by the substrate holding section.