Photomask assembly with reflective photomask and method of manufacturing a reflective photomask

A photomask assembly (900) includes a reflective photomask (100) and a protection structure (200). The reflective photomask (100) includes a substrate (110) and a reflective multilayer (120) on a first substrate surface (111) of the substrate (110) at a front side of the reflective photomask (100)....

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Bibliographische Detailangaben
Hauptverfasser:	SCHEDEL, THORSTEN, SCHENKE, ANDREAS, BENDER, MARKUS
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A photomask assembly (900) includes a reflective photomask (100) and a protection structure (200). The reflective photomask (100) includes a substrate (110) and a reflective multilayer (120) on a first substrate surface (111) of the substrate (110) at a front side of the reflective photomask (100). The protection structure (200) on a second substrate surface (112) of the substrate (110) at a backside of the reflective photomask (100) is detachable from the reflective photomask (100) at a temperature below 150 degree Celsius.