Monitoring process wall depositions and coatings
Various embodiments include apparatuses and methods using the apparatus. In one embodiment, the apparatus includes an adsorption sensor having a light source, and at least a first transparent-window and a second transparent-window mounted on substantially opposing walls in a process chamber through...
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | Various embodiments include apparatuses and methods using the apparatus. In one embodiment, the apparatus includes an adsorption sensor having a light source, and at least a first transparent-window and a second transparent-window mounted on substantially opposing walls in a process chamber through which radiation from the light source traverses. The first windows are selected to be substantially transparent at one or more wavelengths emitted by the light source. A light-source detector is configured to receive radiation transmitted through the second transparent-window and provide an intensity level of the received radiation that includes transmission losses through the first transparent-window and the second transparent-window due to adsorbed films on the windows. Other apparatuses and systems are disclosed. |
---|