Monitoring process wall depositions and coatings

Various embodiments include apparatuses and methods using the apparatus. In one embodiment, the apparatus includes an adsorption sensor having a light source, and at least a first transparent-window and a second transparent-window mounted on substantially opposing walls in a process chamber through...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: ALBAREDE, LUC, RUAN, LING-YAN, SILADIE, CRISTIAN
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Various embodiments include apparatuses and methods using the apparatus. In one embodiment, the apparatus includes an adsorption sensor having a light source, and at least a first transparent-window and a second transparent-window mounted on substantially opposing walls in a process chamber through which radiation from the light source traverses. The first windows are selected to be substantially transparent at one or more wavelengths emitted by the light source. A light-source detector is configured to receive radiation transmitted through the second transparent-window and provide an intensity level of the received radiation that includes transmission losses through the first transparent-window and the second transparent-window due to adsorbed films on the windows. Other apparatuses and systems are disclosed.