An air treatment method and a system arranged for treating air in a clean room

The present invention relates to an air treatment method and a system arranged for treating an air flow to be entered into a semiconductor clean room. Said air flow comprises at least one vapour phase compound, and wherein the air flow is subjected to at least one first treatment process arranged fo...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: BUTCHER, ANDREW, INGERMAR, JONAS, CARSTENS, CECILIE LITSKE
Format: Patent
Sprache:chi ; eng
Schlagworte:
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