An air treatment method and a system arranged for treating air in a clean room

The present invention relates to an air treatment method and a system arranged for treating an air flow to be entered into a semiconductor clean room. Said air flow comprises at least one vapour phase compound, and wherein the air flow is subjected to at least one first treatment process arranged fo...

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Bibliographische Detailangaben
Hauptverfasser:	BUTCHER, ANDREW, INGERMAR, JONAS, CARSTENS, CECILIE LITSKE
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	AIR-CONDITIONING, AIR-HUMIDIFICATION, VENTILATION, USE OF AIRCURRENTS FOR SCREENING BLASTING HEATING LIGHTING MECHANICAL ENGINEERING PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL RANGES SEPARATION TRANSPORTING VENTILATING WEAPONS
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Beschreibung
Zusammenfassung:	The present invention relates to an air treatment method and a system arranged for treating an air flow to be entered into a semiconductor clean room. Said air flow comprises at least one vapour phase compound, and wherein the air flow is subjected to at least one first treatment process arranged for reducing the concentration of the at least one vapour phase compound in the treated air flow below a predefined threshold, and wherein said first treatment process comprises subjecting the air flow to at least one photooxidation step.