Substrate drying chamber

The present invention relates to a substrate drying chamber. The substrate drying chamber includes an upper housing, a lower housing, a sealing part provided on a coupling surface of the lower housing and the upper housing, a substrate placement plate which is coupled to a bottom surface of the lower housing and on which a substrate, on which a pattern wetted with an organic solvent is formed, is disposed, an upper supply port formed in a central region of the upper housing to be directed to the substrate placement plate and configured to provide a supply path of the supercritical fluid for drying, an integrated supply/discharge port formed in the lower housing and configured to provide a supply path of a supercritical fluid for initial pressurization and a discharge path of a mixed fluid in which the organic solvent is dissolved in the supercritical fluid for drying after drying of the substrate according to a supply of the supercritical fluid for drying, and a foreign material discharge part formed in the l