Substrate processing apparatus

In a substrate processing apparatus (100), a transport robot (122) which transports a substrate (W) between an indexer part (110) and a substrate processing part (130) is installed in a substrate transport part (120). The transport fan filter unit (126) is provided in an upper part of the substrate...

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Bibliographische Detailangaben
Hauptverfasser:	ITO, TETSUO, INOUE, KAZUKI, KIKUMOTO, NORIYUKI, YAMADA, KUNIO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEMICONDUCTOR DEVICES SEPARATION TRANSPORTING
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Beschreibung
Zusammenfassung:	In a substrate processing apparatus (100), a transport robot (122) which transports a substrate (W) between an indexer part (110) and a substrate processing part (130) is installed in a substrate transport part (120). The transport fan filter unit (126) is provided in an upper part of the substrate transport part (120). An exhaust port (124p) is provided in the substrate transport part (120). The circulation piping (142) allows the exhaust port (124p) of the substrate transport part (120) and the transport fan filter unit (126) to communicate with each other. The exhaust pipe (146) is connected to the circulation piping (142). The inert gas supply part (148) supplies an inert gas to the circulation piping (142). The circulation fan filter unit (144) is disposed downstream of a connecting portion of the circulation piping (142) with the exhaust pipe (146) to be parallel to a flow path of the circulation piping (142).