Method of manufacturing semiconductor device and system for manufacturing semiconductor device
A method of manufacturing a semiconductor device includes, for a layout diagram stored on a non-transitory computer-readable medium, generating the layout diagram including: selecting a candidate pattern in the layout diagram, the candidate pattern being a first conductive pattern in the M_2nd level...
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| creator | PENG, SHIH-WEI LIN, WEING YANG, TENGIEH TZENG, JIANN-TYNG |
| description | A method of manufacturing a semiconductor device includes, for a layout diagram stored on a non-transitory computer-readable medium, generating the layout diagram including: selecting a candidate pattern in the layout diagram, the candidate pattern being a first conductive pattern in the M_2nd level (first M_2nd pattern) or a first conductive pattern in the M_1st level (first M_1st pattern); determining that the candidate pattern satisfies one or more criteria; and changing a size of the candidate pattern thereby revising the layout diagram. A system for manufacturing a semiconductor device is disclosed herein. |
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| language | chi ; eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Method of manufacturing semiconductor device and system for manufacturing semiconductor device |
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