Process method for heterogeneous epitaxial semiconductor material on mica sheet

The invention is disclosed a process method for heterogeneous epitaxial semiconductor material on mica sheet, comprising steps of providing a mica substrate; and depositing at least one semiconductor film on the mica substrate to form a flexural substrate. The flexural substrate is resistant to bend...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LO, WAN-JUNG, CHU, YING-HAO, CHOU, YIIA
Format: Patent
Sprache:chi ; eng
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