Coating apparatus and coating method

A coating apparatus includes an ALD supply device, a distribution device and an ALD-FBR reactor. The ALD reagent supply device is configured to supply precursor and reactant. The distribution device is connected with the ALD supply device. The ALD-FBR reactor is connected with the distribution devic...

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Bibliographische Detailangaben
Hauptverfasser:	WU, HWAI-JAN, HSIEH, CHIEN-TE, MA, CHIHUNG, LEE, PENG-YANG, HUANG, KUAN-TSAE
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A coating apparatus includes an ALD supply device, a distribution device and an ALD-FBR reactor. The ALD reagent supply device is configured to supply precursor and reactant. The distribution device is connected with the ALD supply device. The ALD-FBR reactor is connected with the distribution device. The distribution device is configured to distribute precursor and reactant into the ALD-FBR reactor.