Method for depositing metal oxide film in liquid environment
A method for depositing a metal oxide film in a liquid environment, comprising steps of: (S1) dissolving an oxidizing agent in solvent with hydrogen bond to form a solution, and (S2) placing a substrate into the solution for performing a deposition reaction to deposit a metal oxide hydroxide film on...
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| Format: | Patent |
| Sprache: | chi ; eng |
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| Zusammenfassung: | A method for depositing a metal oxide film in a liquid environment, comprising steps of: (S1) dissolving an oxidizing agent in solvent with hydrogen bond to form a solution, and (S2) placing a substrate into the solution for performing a deposition reaction to deposit a metal oxide hydroxide film on the substrate, wherein the oxidizing agent is potassium permanganate, potassium chromate, or potassium dichromate, a reaction temperature of the deposition reaction ranges from 1 to 99 degrees Celsius, and a reaction pressure environment of the deposition reaction is an atmospheric pressure environment. |
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