Substrate treatment device

A substrate treatment device includes a substrate support unit, a liquid delivery unit, and a control unit. The substrate support unit includes a rotary table that is adapted for permitting a substrate to be disposed thereon. The liquid delivery unit includes a nozzle that corresponds in position to...

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Bibliographische Detailangaben
Hauptverfasser:	SONG, SIANG-YI, TUNG, JUI-FA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ATOMISING APPARATUS BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY NOZZLES PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SPRAYING APPARATUS SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	A substrate treatment device includes a substrate support unit, a liquid delivery unit, and a control unit. The substrate support unit includes a rotary table that is adapted for permitting a substrate to be disposed thereon. The liquid delivery unit includes a nozzle that corresponds in position to the rotary table and that is movable along a path passing through the center of rotation of the rotary table for delivering a treatment liquid. The control unit is coupled to the liquid delivery unit, includes a human-machine interface that displays a control region for receiving a user input, and that generates a control command in response to the user input, and executes a control program to control the nozzle according to the control command.