Electron source manufacturing method

Disclosed is an electron source manufacturing method. The method comprises: forming one or more fixed emission points on at least one needle tip, wherein the emission point comprises a reaction product formed by metal atoms on a surface of the needle tip and gas molecules.

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: LIU, HUA-RONG, ZHENG, CHUN-NING, HU, XIAN-BIN, CHEN, DI-ZHI, TANG, GUANG, ZHENG, LEI, QIAN, QING, WANG, XUE-HUI, WANG, JUN-TING, WANG, GUOAO
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Disclosed is an electron source manufacturing method. The method comprises: forming one or more fixed emission points on at least one needle tip, wherein the emission point comprises a reaction product formed by metal atoms on a surface of the needle tip and gas molecules.