Photosensitive resin composition, method for forming resist pattern, and method for manufacturing plated shaped body

The present invention is a photosensitive resin composition characterized by containing a polymerizable compound (A), a light radical polymerization initiator (B), a thiol compound (C), and a polymerization inhibitor (D), the content of the thiol compound (C) being 5-50 mass parts to 100 mass parts...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	MATSUMOTO, TOMOYUKI, KIMURA, YU, ISHIKAWA, HIROKI, SATOU, KEIICHI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	The present invention is a photosensitive resin composition characterized by containing a polymerizable compound (A), a light radical polymerization initiator (B), a thiol compound (C), and a polymerization inhibitor (D), the content of the thiol compound (C) being 5-50 mass parts to 100 mass parts of the polymerizable compound (A), and the content of the polymerization inhibitor (D) being 1-10 mass parts to 100 mass parts of the polymerizable compound (A). The present invention makes it possible to provide a photosensitive resin composition having wide exposure latitude (EL) in both bright fields and dark fields. Using the photosensitive resin composition, it is possible to provide a method for forming a resist pattern with which it is possible to form a fine resist pattern having good accuracy in both bright fields and dark fields. Using a resist pattern formed using the method for forming a resist pattern, it is possible to provide a method for manufacturing a plated shaped body with which it is possible t