Fabrication facility and method for fault detection in fabrication facility

Fabrication facility and method for fault detection in fabrication facility

The present disclosure provides a method for fault detection in a fabrication facility. The method includes moving a wafer into a processing tank, staying the wafer in the processing tank for a while, and removing the wafer from the processing tank. The method further includes emitting an acoustic e...

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Hauptverfasser: JUE, JA-SUMS, LIU, CHENG-WEI, CHAN, I-PIN, FAN, CHE-LUN, SU, YINGU
Format: Patent
Sprache:chi ; eng
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BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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creator JUE, JA-SUMS
LIU, CHENG-WEI
CHAN, I-PIN
FAN, CHE-LUN
SU, YINGU
description The present disclosure provides a method for fault detection in a fabrication facility. The method includes moving a wafer into a processing tank, staying the wafer in the processing tank for a while, and removing the wafer from the processing tank. The method further includes emitting an acoustic energy into the processing tank and producing data associated with a measured acoustic energy according to the detected acoustic energy that is transmitted from the processing tank. The method also includes comparing the data associated with the measured acoustic energy and data associated with a desired acoustic energy and issuing a waning when there is a difference.
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title Fabrication facility and method for fault detection in fabrication facility
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