Particle mixture, kit, ink, methods and article
A particle mixture for forming an enamel comprising particles of a first glass frit and particles of a second glass frit; wherein the first glass frit comprises greater than 5wt% silicon oxide (SiO2) and less than 5wt% boron oxide (B2O3); wherein the second glass frit comprises boron oxide (B2O3) an...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | A particle mixture for forming an enamel comprising particles of a first glass frit and particles of a second glass frit; wherein the first glass frit comprises greater than 5wt% silicon oxide (SiO2) and less than 5wt% boron oxide (B2O3); wherein the second glass frit comprises boron oxide (B2O3) and less than 5wt% of silicon oxide (SiO2); and wherein both the particles of the first glass frit and the particles of the second glass frit have a D90 particle size of less than 5 microns. Also described is an ink comprising the particle mixture, methods of preparing the ink, an article formed using the ink, and a kit comprising particles of the first and second glass frit. |
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