Substrate vacuum treatment apparatus and method of vacuum treating a substrate or of manufacturing a vacuum treated substrate
A vacuum treatment apparatus for substrate comprising a vacuum treatment arrangement (3). An input load-lock arrangement (1i) leads towards and into the vacuum treatment arrangement (3) and an output load-lock arrangement (1o) leads from the vacuum treatment arrangement (3). One (1i) of the two load...
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| Format: | Patent |
| Sprache: | chi ; eng |
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| Zusammenfassung: | A vacuum treatment apparatus for substrate comprising a vacuum treatment arrangement (3). An input load-lock arrangement (1i) leads towards and into the vacuum treatment arrangement (3) and an output load-lock arrangement (1o) leads from the vacuum treatment arrangement (3). One (1i) of the two load-lock arrangements (1i, 1o) comprises at least two load-locks (10ai, 10bi) in series respectively pumped by pumps (12ai, 12bi). |
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