Substrate processing device and substrate processing method

The present invention addresses the problem of preventing overflow of a processing liquid from a tank in a substrate processing device that reuses the processing liquid, even when the capacity of the tank is reduced. This substrate processing device performs predetermined processing on a substrate b...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: MIZUKAMI, DAIJO, ISHII, HIROAKI
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The present invention addresses the problem of preventing overflow of a processing liquid from a tank in a substrate processing device that reuses the processing liquid, even when the capacity of the tank is reduced. This substrate processing device performs predetermined processing on a substrate by discharging a processing liquid containing one or more kinds of chemicals and pure water. This substrate processing device is provide with: a storage tank that stores the processing liquid for performing the predetermined processing on the substrate; a substrate processing unit that performs the predetermined processing on the substrate by discharging onto the substrate the processing liquid supplied from the storage tank; a discharge amount acquisition device that acquires the discharge amount of the processing liquid discharged onto the substrate by the substrate processing unit; a recovery pipe for recovering the processing liquid discharged in the substrate processing unit to the substrate; and a processing l