Substrate processing device and substrate processing method
The present invention addresses the problem of preventing overflow of a processing liquid from a tank in a substrate processing device that reuses the processing liquid, even when the capacity of the tank is reduced. This substrate processing device performs predetermined processing on a substrate b...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The present invention addresses the problem of preventing overflow of a processing liquid from a tank in a substrate processing device that reuses the processing liquid, even when the capacity of the tank is reduced. This substrate processing device performs predetermined processing on a substrate by discharging a processing liquid containing one or more kinds of chemicals and pure water. This substrate processing device is provide with: a storage tank that stores the processing liquid for performing the predetermined processing on the substrate; a substrate processing unit that performs the predetermined processing on the substrate by discharging onto the substrate the processing liquid supplied from the storage tank; a discharge amount acquisition device that acquires the discharge amount of the processing liquid discharged onto the substrate by the substrate processing unit; a recovery pipe for recovering the processing liquid discharged in the substrate processing unit to the substrate; and a processing l |
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