Target and process for producing a target

Target for physical vapour phase deposition having the following chemical composition: - 95 mol% to 100 mol% of a mixture of at least two of the following compounds: titanium diboride (TiB2) and/or vanadium diboride (VB2) and/or mixed phases ((Ti,V)B2) of titanium diboride (TiB2) and vanadium dibori...

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Bibliographische Detailangaben
Hauptverfasser:	WOERLE, SABINE, POLICIK, PETER
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ALLOYS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL FERROUS OR NON-FERROUS ALLOYS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF ALLOYS OR NON-FERROUS METALS
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Beschreibung
Zusammenfassung:	Target for physical vapour phase deposition having the following chemical composition: - 95 mol% to 100 mol% of a mixture of at least two of the following compounds: titanium diboride (TiB2) and/or vanadium diboride (VB2) and/or mixed phases ((Ti,V)B2) of titanium diboride (TiB2) and vanadium diboride (VB2) - 0.01 mol% to 5 mol% of carbon (C) - less than 0.01 mol% of borides other than titanium diboride (TiB2) and/or vanadium diboride (VB2) and/or mixed phases ((Ti,V)B2) of titanium diboride (TiB2) and vanadium diboride (VB2), wherein in respect of the metallic purity the sum of the mixture of titanium diboride (TiB2) and/or vanadium diboride (VB2) and/or mixed phases ((Ti,V)B2) of titanium diboride (TiB2) and vanadium diboride (VB2) and the carbon (C) amounts to at least 99.8 mol%, and having the following physical properties: - a density greater than 90%, preferably greater than 95%, of the theoretical density of the chemical composition defined above - an average grain size of grains of the mixture of tita