Method for forming a chemical guiding structure on a substrate and chemoepitaxy method
The invention concerns a method for forming a chemical guiding structure intended for self-assembly of a block copolymer by chemoepitaxy, where the method comprises the following steps: -forming on a substrate (100) a functionalisation layer (220) made of a first polymer material (140) having a firs...
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Format: | Patent |
Sprache: | chi ; eng |
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