Method of manufacturing fine pattern and method of manufacturing display device using the same

The present invention provides a method of manufacturing a resist pattern of effectively below the resolution limit, which is suitable for use in the liquid crystal display device manufacturing field. In particular the present invention provides a method of accurately manufacturing a high-defined pattern of below the resolution limit while maintaining a pattern shape having a taper shape. A method of manufacturing a fine pattern comprising the following steps of: coating a resist composition comprising a novolak resin having an al kali dissolution rate of 100 to 3,000 Å on a substrate to form a resist composition layer; subjecting said resist composition layer to exposure; developing said resist composition layer to form a resist pattern; subjecting said resist pattern to flood exposure; coating a fine pattern forming composition on the surface of said resist pattern to form a fine pattern forming composition layer; heating said resist pattern and said fine pattern forming composition layer to cure the region