Laser beam monitoring system

A laser beam monitoring system configured to monitor an attribute of an incident laser beam, the laser beam monitoring system comprising a beam separating element and a plurality of sensors, wherein the beam separating element is configured to form a plurality of sub-beams from the incident laser be...

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Bibliographische Detailangaben
1. Verfasser:	VAN GREEVENBROEK, HENDRIKUS ROBERTUS MARIE
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
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Beschreibung
Zusammenfassung:	A laser beam monitoring system configured to monitor an attribute of an incident laser beam, the laser beam monitoring system comprising a beam separating element and a plurality of sensors, wherein the beam separating element is configured to form a plurality of sub-beams from the incident laser beam, a first sub-beam being directed towards a first sensor of the plurality of sensors and a second sub-beam being directed towards a second sensor of the plurality of sensors, wherein relative intensities of the first and second sub-beams are determined by a spatial position at which the incident laser beam is incident upon the beam separating element.