Curable composition, photosensitive resin composition, photosensitive resin film, color filter and method of manufacturing a pixel

Provided are a curable composition, a photosensitive resin composition, a photosensitive resin film, a color filter and a method of manufacturing a pixel for a color filter. The curable composition including a quantum dot; resin; a light diffusing agent having a primary particle diameter of 80 nm to...

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Bibliographische Detailangaben
Hauptverfasser:	SON, BYEONG-GEUN, LEE, BUM-JIN, YIM, JI-HYEON, KANG, YONG-HEE, CHOI, MI-JEONG, KIM, JEONG-YEON, KIM, DONG-JUN, KIM, JONG-GI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Provided are a curable composition, a photosensitive resin composition, a photosensitive resin film, a color filter and a method of manufacturing a pixel for a color filter. The curable composition including a quantum dot; resin; a light diffusing agent having a primary particle diameter of 80 nm to 200 nm and a secondary particle diameter of 120 nm to 250 nm; and a solvent. The photosensitive resin composition including a quantum dot; a binder resin; a photopolymerizable monomer; a photopolymerization initiator; a light diffusing agent having a primary particle diameter of 80 nm to 200 nm and a secondary particle diameter of 120 nm to 250 nm; and a solvent. The color filter manufactured using the curable composition or the photosensitive resin composition.