Patterning device, manufacturing method for a patterning device, system for patterning a reticle, calibration method of an inspection tool, and lithographic apparatus

A calibration method for an inspection tool, the calibration method comprising determining a calibration parameter of the inspection tool by: - receiving data associated with one or more substrates comprising a plurality of target portions onto which a respective plurality of patterns is provided, whereby the plurality of patterns are formed by a semiconductor manufacturing process characterized by a known variation of at least one process parameter with respect to a nominal value; - determining a characteristic of each of the plurality of patterns based on the received data; and - determining the calibration parameter of the inspection tool, based on the measured characteristics and the known process parameter variation.